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CH1012
SOME TECHNOLOGY
Aromatic photo-resist materials for fabricating integrated circuit devices.
• Light sensitive
aromatic resist.
• Developer
is a solvent.
• SiO2 layer
below is
etched away
& then dopant
added.
Elemental silicon is obtained by reduction of molten SiO2.   SiO2(l) + 2C(s)  Si(l) + 2CO(g)
then zone refined